Publication | Closed Access
The effect of oxygen on the N2 photofixation ability over N vacancies embedded g-C3N4 prepared by dielectric barrier discharge plasma treatment
25
Citations
45
References
2019
Year
Materials ScienceMaterials EngineeringElectrical EngineeringChemical EngineeringEngineeringPhotochemistryGlow DischargeNonthermal PlasmaN VacanciesVacuum DeviceGas Discharge PlasmaN2 Photofixation AbilityPlasma Processing
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