Surface characterisation of TiC _<i>x</i> N _{1 − <i>x</i>} coatings processed by cathodic arc physical vapour deposition: XPS and XRD analysis

Abstract

The properties of titanium carbonitride (TiCN) can be controlled by maintaining the C―N ratio within the coating to a certain level. An experimental study was carried out to vary the composition and properties of TiCN using cathodic arc physical vapour deposition (CAPVD). The substrate used was tungsten carbide (WC‐6Co), which was prepared in‐house through a powder metallurgy process. In order to form the TiC x N 1 − x coatings, titanium (Ti) was used as the cathode, while methane (CH 4 ) and nitrogen (N 2 ) gases were used as sources for C and N, respectively. X‐ray photoelectron spectroscopy (XPS) and X‐ray diffraction (XRD) were used to investigate the composition, chemical state, and bonding structure of the deposited coatings. The results show that the composition, intensity of elements, lattice parameter, and d‐value of TiC x N 1 − x coatings were successfully varied by controlling the CH 4 fraction (CH 4 /N 2 ratio). With the increase in CH 4 fraction, the intensity of C and N within the TiC x N 1 − x coatings increased and decreased, respectively. Consequently, the C―Ti and C―N bonds were increased and N―Ti bonds were decreased.