Publication | Closed Access
Investigation of c-Si surface passivation using thermal ALD deposited HfO2 films
29
Citations
31
References
2019
Year
Materials ScienceHfo2 FilmsC-si Surface PassivationEngineeringSurface ScienceApplied PhysicsSemiconductor Device FabricationThin FilmsSilicon On InsulatorChemical Vapor DepositionThermal AldSemiconductor Device
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