Publication | Closed Access
Simple method preparation for ultrathin VO<sub>2</sub> thin film and control: nanoparticle morphology and optical transmittance
11
Citations
28
References
2019
Year
Optical MaterialsOptical TransmittanceEngineeringNanosheetOptoelectronic DevicesThin Film Process TechnologyIi-vi SemiconductorVanadium DioxideNanoscale MorphologyNanostructure SynthesisThin Film ProcessingMaterials ScienceSimple Method PreparationVo2 LatticeNanotechnologyLayered MaterialNanomaterialsSurface ScienceApplied PhysicsThin FilmsNanoparticle Morphology
Nanoscale morphology of vanadium dioxide (VO2) thin films can be controlled to realize smooth ultrathin crystalline films (<10 nm) with a simple way of DC sputtering. Here, crystallization annealing conditions determine whether a continuous ultrathin film or nanoparticle morphology is obtained. The experiments show that ultrathin VO2 thin films possess both a highly crystal orientation (020) and an obvious metal-insulator transition (MIT). Meanwhile, optical transmittance between the visible and near-infrared regions can be modulated by thin film thickness, and the strain in the VO2 lattice is also found to be dependent on the thin film thickness. The 8 nm thickness thin film shows that the change of resistance and visible transmittance is 2.8 orders of magnitude and 77.5%, respectively.
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