Publication | Open Access
Ultra-low volume oxygen tolerant photoinduced Cu-RDRP
72
Citations
53
References
2019
Year
Chemical EngineeringEngineeringPhotochemistryNanomaterialsInorganic PhotochemistrySynthetic PhotochemistryPhotophysical PropertyPhoto-electrochemical CellBioimagingPhotopolymer NetworkChemistryHybrid MaterialsPhotoelectrochemistrySemi-fluorinated MonomersOptoelectronics
We introduce the first oxygen tolerant ultra-low volume (as low as 5 μL) photoinduced Cu-RDRP of a range of hydrophobic, hydrophilic and semi-fluorinated monomers.
| Year | Citations | |
|---|---|---|
Page 1
Page 1