Electromechanical properties of cathodic arc deposited high entropy alloy thin films on polymer substrates

Abstract

Within this work, in situ tensile straining tests are employed to study the electromechanical properties of MoNbTaVW and AlCuCrTaTi high entropy alloy thin films which were synthesized by cathodic arc deposition on polyimide substrates at room temperature. The crack onset strains of MoNbTaVW and AlCuCrTaTi were observed to be around 2% and 2.5%, respectively. The sharp rise in resistance at strains exceeding the crack onset strain indicates a brittle behavior of both films, while the interfacial shear stress is higher for the MoNbTaVW film.