Oxygen‐Assisted Cathodic Deposition of Zeolitic Imidazolate Frameworks with Controlled Thickness

Abstract

Processing metal-organic frameworks (MOFs) as films with controllable thickness on a substrate is increasingly crucial for many applications to realize function integration and performance optimization. Herein, we report a facile cathodic deposition process that enables the large-area preparation of uniform films of zeolitic imidazolate frameworks (ZIF-8, ZIF-71, and ZIF-67) with highly tunable thickness ranging from approximately 24 nm to hundreds of nanometers. Importantly, this oxygen-reduction-triggered cathodic deposition does not lead to the plating of reduced metals (Zn and Co). It is also operable cost-effectively in the absence of supporting electrolyte and facilitates the construction of well-defined sub-micrometer-sized heterogeneous structures within ZIF films.