Characterization of buried photonic crystal waveguides and microcavities fabricated by deep ultraviolet lithography

Abstract

We present results of the optical characterization of silicon photonic crystal waveguides and microcavities that are completely buried in a silicon dioxide cladding and are fabricated by deep ultraviolet (UV) lithography. The advantages of buried waveguides and deep UV lithography are discussed. Transmission spectra and loss factors for photonic crystal waveguides, as well as quality factors for resonant microcavities, are obtained. The observed characteristics are in good agreement with three-dimensional simulations.