Publication | Closed Access
Influence of oxygen partial pressure on microstructure, optical properties, residual stress and laser induced damage threshold of amorphous HfO2 thin films
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Citations
48
References
2018
Year
Materials ScienceOptical MaterialsEngineeringOptical PropertiesApplied PhysicsPulsed Laser DepositionResidual StressThin FilmsAmorphous SolidThin Film ProcessingOxygen Partial Pressure
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