Reparable Superhydrophobic Surface with Hidden Reactivity, Its Photofunctionalization and Photopatterning

Abstract

Abstract Superhydrophobic (SH) surfaces have held great promise during the last decade because of their diverse potential applications as self‐cleaning surfaces, in microfluidics, microarrays, etc. Recently, reactive SH surfaces combining their liquid‐repellency with the possibility for convenient postfunctionalization and patterning were introduced. However, current concepts for making reactive SH materials have very limited selection of “hydrophobic as well as reactive” groups. Here a novel reparable SH surface with hidden reactivity (SuSHiR) based on photodynamic properties of disulfides is reported. Reactive hydrophobic, SH, as well as superhydrophilic surfaces are fabricated using this method. The method allows the use of diverse end functionalities (reactive or nonreactive, hydrophobic, or hydrophilic), while keeping the same reactive disulfides “hidden” in the middle of the functional surface‐grafted chains. The photoreactivity of the disulfide bond allows for the functionalization and patterning of various molecules through UV irradiation. The obtained SuSHiR exhibits better stability compared to conventional reactive SH surfaces, and the reversibility of the disulfide–disulfide exchange reaction enables reversible patterning as well as photorestoration of damaged functionalities.