Selective atomic layer deposition of MoSix on Si (0 0 1) in preference to silicon nitride and silicon oxide - Concepedia

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Selective atomic layer deposition of MoSix on Si (0 0 1) in preference to silicon nitride and silicon oxide

18

Citations

27

References

2018

Year

Jong Youn Choi, Christopher F. Ahles, Raymond Hung, Namsung Kim, Andrew C. Kummel

Applied Surface Science

Materials ScienceEngineeringNanoelectronicsOxide ElectronicsSurface ScienceApplied PhysicsSemiconductor MaterialSemiconductor Device FabricationSilicon On InsulatorChemical Vapor Deposition

References

	Year	Citations

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