Model of dielectric breakdown in hafnia-based ferroelectric capacitors

Abstract

Ultra-thin ferroelectric hafnia-based thin films are very promising candidates for nanoscale ferroelectric random access memories. However, dielectric breakdown is a main failure mechanism during repeated polarization switching. Generalizing Lou et al.'s local phase decomposition model, originally for ferroelectric fatigue, we propose a dielectric breakdown model for ferroelectric hafnia. While charging injection during the polarization reversal is regarded as a key step, eventual phase separation of the Hf cluster accounts for the dielectric breakdown. Using this model, we explain why TaN/HfO2/TaN ferroelectric capacitors are more prone to dielectric breakdown than TiN/HfO2/TiN, and conclude that the lower Schottky barrier for the TaN/Pca21-HfO2 interface stabilizes neutral oxygen vacancies within the dielectric. On the other hand, when TiN electrodes are employed, oxygen vacancies tend to be positively charged. They can further pin the domain walls, resulting in ferroelectric fatigue. The relationship between the conductive filament formation, dielectric breakdown, wake up, and fatigue in ferroelectric HfO2 is discussed within the framework of our model.