Nanosecond pulsed plasma discharge over a flowing water film: Characterization of hydrodynamics, electrical, and plasma properties and their effect on hydrogen peroxide generation

Abstract

A continuously flowing liquid film reactor driven by a variable nanosecond pulsed power supply, where plasma channels generated in argon propagate along the water film, was utilized to assess the effects of output voltage setting, pulse frequency, and gas/liquid flow rate on the generation of H 2 O 2 . Increasing the voltage significantly impacted the discharge current, resulting in hotter/denser plasma channels that increased the production rate of hydrogen peroxide but lowered the energy yield. Variation in pulse frequency and gas/liquid flow rates had little impact on electrical and plasma properties, however, the production of H 2 O 2 per pulse decreased with increasing pulse frequency and was shown to be linked to insufficient chemical and/or thermal dissipation of the gas phase between pulses.