Publication | Closed Access
Optimal target sputtering mode for aluminum nitride thin film deposition by high power pulsed magnetron sputtering
31
Citations
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References
2018
Year
Materials ScienceMaterials EngineeringAluminium NitrideEngineeringApplied PhysicsHigh PowerMagnetron SputteringThin FilmsPulsed Laser DepositionMicroelectronicsChemical DepositionThin Film ProcessingOptimal Target
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