Publication | Closed Access
In-plane stress development in mesoporous thin films
28
Citations
47
References
2018
Year
Materials ScienceMaterial AnalysisEngineeringSelf-assemblySurface ScienceApplied PhysicsEvaporation-induced Self-assemblyResidual In-plane StressThin Film Process TechnologyChemistryThin FilmsMesoporous Thin FilmsChemical Vapor DepositionThin Film ProcessingMaterial Preparation
Ordered mesoporous thin films of TiO<sub>2</sub>and Ce<sub>x</sub>Zr<sub>1−x</sub>O<sub>2</sub>(<italic>x</italic>= 0, 0.5, 1) were prepared<italic>via</italic>an evaporation-induced self-assembly (EISA) process and subsequently investigated in terms of the developing intrinsic and residual in-plane stress.
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