Publication | Closed Access

Effect of deposition parameters on structural, mechanical and electrochemical properties in Ti/TiN thin films on AISI 316L substrates produced by r. f. magnetron sputtering

Materials ScienceMaterials EngineeringEngineeringDeposition ParametersSurface ScienceApplied PhysicsAisi 316LTi/tin Thin FilmsThin FilmsChemical DepositionMicroelectronicsChemical Vapor DepositionThin Film Processing