Epitaxial Aluminum-on-Sapphire Films as a Plasmonic Material Platform for Ultraviolet and Full Visible Spectral Regions

Abstract

In comparison to noble metals (gold and silver), aluminum is a sustainable and widely applicable plasmonic material owing to its abundance in the Earth's crust and compatibility with the complementary metal–oxide–semiconductor (CMOS) technology for integrated devices. Aluminum (Al) has a superior performance in the ultraviolet (UV) regime with the lowest material loss and good performance in the full visible regime. Furthermore, aluminum films can remain very stable in ambient environment due to the formation of surface native oxide (alumina) acting as a passivation layer. In this work, we develop an epitaxial growth technique for forming atomically smooth aluminum films on transparent c-plane (0001) sapphire (Al-on-Sapphire, ALOSA) by molecular-beam epitaxy (MBE). The MBE-grown ALOSA films have small plasmonic losses and enable us to fabricate and utilize high-quality plasmonic nanostructures in a variety of optical configurations (reflection, transmission, and scattering). Here, the surface roughness and crystal orientation of ALOSA films are characterized by atomic force microscopy (AFM) and X-ray diffraction (XRD). Moreover, the formation of smooth native oxide layer and abrupt heterointerfaces are investigated by transmission electron microscopy (TEM). We have also measured the optical dielectric function of epitaxial aluminum films by using spectroscopic ellipsometry (SE). These results show that the structural and optical properties of epitaxial aluminum films grown by MBE are excellent compared to polycrystalline aluminum films grown by other deposition methods. To illustrate the capability of device applications for the full visible spectrum, we demonstrate clear surface plasmon polarition (SPP) interference patterns using a series of double-groove surface interferometer structures with varied groove–groove separations under white-light illumination. Finally, we show the device performance of zinc oxide (ZnO) nanowire (UV) and indium gallium nitride (InGaN) nanorod (blue and green) plasmonic lasers prepared by using the epitaxial Al films. The measured lasing thresholds are comparable with the best available data obtained on the Ag films. According to these result, we suggest that epitaxial ALOSA films are a versatile plasmonic material platform in the UV and full visible spectral regions.