A facile synthesis of reduced holey graphene oxide for supercapacitors

Abstract

Hydroxyl radicals (˙OH) generated from a UV/O₃ solution reaction is used to efficiently etch graphene oxide nanosheets under moderate conditions. Reduced holey graphene oxide is directly used as a supercapacitor electrode material and exhibits high specific capacitance (224 F g^-1 at a current density of 1 A g^-1) and high volumetric capacitance (up to 206 F cm^-3).