Morphological and optical study of thin films of CuAlS₂deposited by metal organic chemical vapour deposition technique

Abstract

Single solid source precursor of Copper–Aluminium dithiocarbamate was prepared and characterized by infrared spectroscopy. Thin films of copper aluminium sulphide were deposited on the substrate (soda lime glass) using metal organic chemical vapour deposition (MOCVD) technique within temperature ranges of 420 and 450 °C through the pyrolysis of the prepared precursor. Morphological and optical characterizations were then carried out. Morphological study carried out using scanning electron microscopy (SEM) showed that the deposited films are dense and polycrystalline in nature, uniform with the particle size distribution of the grains decreasing with increase in temperature. A direct optical energy gap of 3.28 and 2.88 eV were obtained for films deposited at 420 and 450 °C respectively. Other optical constants were found to increase as temperature increased.