Oxygen accumulation on metal surfaces investigated by XPS, AES and LEIS, an issue for sputter depth profiling under UHV conditions - Concepedia

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Publication | Closed Access

Oxygen accumulation on metal surfaces investigated by XPS, AES and LEIS, an issue for sputter depth profiling under UHV conditions

23

Citations

48

References

2017

Year

R. Steinberger, C. Celedón, Barbara Bruckner, D. Roth, Jiri Duchoslav, Martin Arndt, Philipp Kürnsteiner, Thomas Steck, Josef Faderl, Christian K. Riener,

Applied Surface Science

Materials ScienceSurface CharacterizationEngineeringUhv ConditionsCorrosionSurface AnalysisSurface ScienceApplied PhysicsMetal SurfacesVacuum DeviceChemical DepositionOxygen Accumulation

References

	Year	Citations

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