Nanoimprint Lithography on Silica Sol–Gels: A Simple Route to Sequential Patterning

Abstract

Inorganic condensing sol-gel films are promising resist materials for nanoimprint lithography. We demonstrate that sequential patterning of these materials can be performed by controlling their condensation state. As a consequence, multilevel inorganic patterns can be obtained by superimposing structures, as show here, where successive stamping of a line pattern leads to two-level square features.