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Atomistic mechanisms of Si chemical mechanical polishing in aqueous H2O2: ReaxFF reactive molecular dynamics simulations

Materials ScienceMaterials EngineeringChemical KineticsChemical EngineeringEngineeringInterface ChemistrySurface ChemistrySurface ScienceMolecular Dynamics SimulationsNanoscale ModelingPhysical ChemistryAqueous H2o2Surface ReactivityInterfacial StudyChemistryMolecular DynamicsAtomistic Mechanisms