Generation of non‐equilibrium condition in solution plasma discharge using low‐pass filter circuit

YongKang Heo, Seung Hyo Lee, Maria Antoaneta Bratescu, Sung Min Kim, Gyoung‐Ja Lee, Nagahiro Saito

Plasma Processes and Polymers · 2016 · 10 citations · 43 references

Concepts

Abstract

Solution plasma process has been researched as one of the synthetic methods of nano‐ and functional materials using plasma discharge in liquids. In this study, a low‐pass filter circuit was introduced to increase the density and temperature of electrons involved in a non‐equilibrium condition. The discharge properties of the solution plasma generated by conventional and low‐pass filter circuits were characterized and comparatively analyzed. Filtration of the MHz range current oscillations, an increase in the maximum discharge current, and a higher stability of solution plasma were obtained by simply inserting a resistor‐capacitor (RC) component in the circuit, which leads to the increases in the density and temperature of electrons.

References

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