Publication | Open Access

Multi-objective optimization of tungsten CMP slurry for advanced semiconductor manufacturing using a response surface methodology

Materials EngineeringMaterials ScienceTungsten Cmp SlurryEngineeringMaterial ProcessingIndustrial EngineeringResponse Surface MethodologyMechanical EngineeringMetallurgical ProcessMulti-objective OptimizationManufacturing EngineeringSurface ProcessingMicrostructureMetal Processing