Substitution of native silicon oxide by titanium in Ni-coated silicon photoanodes for water splitting solar cells

Abstract

The native SiO_Xof nickel coated<italic>n</italic>Si photoanodes is replaced by a 2 nm thick Ti film. The resulting Ni/Ti/<italic>n</italic>Si photoanodes reach impressively low onset potential (−42 mV<italic>vs</italic>. SCE) and long stability (10 mA cm⁻²at 0.8 V<italic>vs.</italic>SCE for 6.5 days) for the water oxidation process, which is comparable to that of more complex and expensive cells based on n–p⁺homojunctions.