Infrared Response and Optoelectronic Memory Device Fabrication Based on Epitaxial VO₂ Film

Abstract

In this work, high-quality VO₂ epitaxial films were prepared on high-conductivity n-GaN (0001) crystal substrates via an oxide molecular beam epitaxy method. By fabricating a two-terminal VO₂/GaN film device, we observed that the infrared transmittance and resistance of VO₂ films could be dynamically controlled by an external bias voltage. Based on the hysteretic switching effect of VO₂ in infrared range, an optoelectronic memory device was achieved. This memory device was operated under the "electrical writing-optical reading" mode, which shows promising applications in VO₂-based optoelectronic device in the future.