Publication | Closed Access
Plasma characteristics and properties of Cu films prepared by high power pulsed magnetron sputtering
29
Citations
36
References
2016
Year
Materials ScienceMaterials EngineeringMagnetismPlasma CharacteristicsCu FilmsEngineeringApplied PhysicsMagnetron SputteringThin FilmsGas Discharge PlasmaPlasma ApplicationPlasma ProcessingElectrical Insulation
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