Concepedia

Main properties of Al2O3 thin films deposited by magnetron sputtering of an Al2O3 ceramic target at different radio-frequency power and argon pressure and their passivation effect on p-type c-Si wafers

J.A. García-Valenzuela, Richard Rivera, Anna Belen Morales‐Vilches, Luís G. Gerling, A. C. Caballero, J.M. Asensi, C. Voz, J. Bertomeu, J. Andreu

Thin Solid Films · 2016 · 45 citations · 22 references

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References

22

The Evolution of Silicon Wafer Cleaning Technology

Werner Kern · Journal of The Electrochemical Society · 1990 · 1.7K citations

, , +17

Cleaning solutions based on hydrogen peroxide for use in silicon semiconductor technology

Werner Kern · Medical Entomology and Zoology · 1970 · 820 citations

, , +14

Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells

G. Dingemans, W. M. M. Kessels · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2012 · 787 citations · Full text

, , +17

Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3

Bram Hoex, S. B. S. Heil, E. Langereis et al. · Applied Physics Letters · 2006 · 720 citations · Full text

, , +17

Silicon surface passivation by atomic layer deposited Al2O3

Bram Hoex, Jan Schmidt, Peter Pohl et al. · Journal of Applied Physics · 2008 · 474 citations · Full text

, , +17