Publication | Open Access
Thermal stability of Mg<sub>2</sub>Si<sub>0.4</sub>Sn<sub>0.6</sub> in inert gases and atomic-layer-deposited Al<sub>2</sub>O<sub>3</sub> thin film as a protective coating
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Citations
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References
2016
Year
EngineeringChemical DepositionThermal StabilityThin Film ProcessingProtective CoatingThermoelectric PropertiesMaterials ScienceMaterials EngineeringThermal Barrier CoatingSemiconductor MaterialMaterial AnalysisHigh Temperature MaterialsSurface ScienceApplied PhysicsThermoelectric MaterialThin FilmsChemical Vapor DepositionThermal PropertiesInert Gases
The structure and thermoelectric properties of Mg<sub>2</sub>Si<sub>0.4</sub>Sn<sub>0.6</sub> are unstable above 700 K. We demonstrated atomic-layer-deposited Al<sub>2</sub>O<sub>3</sub> as a protective coating to address this problem.
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