Publication | Closed Access
Sputtered Si3N4 and SiO2 electron barrier layer between a redox electrolyte and the WO3 film in electrochromic devices
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Citations
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References
2016
Year
Materials ScienceEngineeringElectrode-electrolyte InterfaceBarrier LayerOxide ElectronicsSurface ScienceApplied PhysicsSilicon On InsulatorThin FilmsWo3 FilmMicroelectronicsElectrochemical InterfaceRedox ElectrolyteElectrochemistry
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