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Synthesis, structure, vapour pressure and deposition of ZnO thin film by plasma assisted MOCVD technique using a novel precursor bis[(pentylnitrilomethylidine) (pentylnitrilomethylidine-μ-phenalato)]dizinc(II)

Materials ScienceInorganic ChemistryEngineeringOxide ElectronicsSurface ScienceVapour PressureThin Film Process TechnologyChemistryThin FilmsZno Thin FilmMocvd TechniqueChemical Vapor DepositionThin Film Processing