Publication | Closed Access
Atomically thin lateral p–n junction photodetector with large effective detection area
102
Citations
44
References
2016
Year
EngineeringMonolayer Wse2 DeviceOptoelectronic DevicesSemiconductor DeviceSemiconductorsIi-vi SemiconductorPhotoelectric SensorElectronic DevicesPhotodetectorsCompound SemiconductorSemiconductor TechnologyElectrical EngineeringPhysicsTopological HeterostructuresNanotechnologyOptoelectronic MaterialsTmd-electrode InterfacePhotoelectric MeasurementLayered MaterialActive AreaTransition Metal ChalcogenidesApplied PhysicsMultilayer HeterostructuresOptoelectronics
The widely used photodetector design based on atomically thin transition metal dichalcogenides (TMDs) has a lateral metal-TMD-metal junction with a fairly small, line shape photoresponsive active area at the TMD-electrode interface. Here, we report a highly efficient photodetector with extremely large photoresponsive active area based on a lateral junction of monolayer-bilayer WSe2. Impressively, the separation of the electron–hole pairs (excitons) extends onto the whole 1L–2L WSe2 junction surface. The responsivity of the WSe2 junction photodetector is over 3200 times higher than that of a monolayer WSe2 device and leads to a highest external quantum efficiency of 256% due to the efficient carrier extraction. Unlike the TMD p–n junctions modulated by dual gates or localized doping, which require complex fabrication procedures, our study establishes a simple, controllable, and scalable method to improve the photodetection performance by maximizing the active area for current generation.
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