Modeling of H2 and H2/CH4 Moderate-Pressure Microwave Plasma Used for Diamond Deposition

Mechanism for diamond growth from methyl radicals

Stephen J. Harris · Applied Physics Letters · 1990 · 394 citations

Natural Sciences, Chemistry, Materials Science +15

Cross Sections and Related Data for Electron Collisions with Hydrogen Molecules and Molecular Ions

H. Tawara, Yukikazu Itikawa, Hitoshi Nishimura et al. · Journal of Physical and Chemical Reference Data · 1990 · 380 citations

Natural Sciences, Chemistry, Physics +17

Cross Sections and Swarm Coefficients for H+, H2+, H3+, H, H2, and H− in H2 for Energies from 0.1 eV to 10 keV

A. V. Phelps · Journal of Physical and Chemical Reference Data · 1990 · 337 citations

Natural Sciences, Chemistry, Physics +14

A Mathematical Model of Silicon Chemical Vapor Deposition: Further Refinements and the Effects of Thermal Diffusion

Michael E. Coltrin, Robert J. Kee, James A. Miller · Journal of The Electrochemical Society · 1986 · 271 citations

Engineering, Chemical Engineering, Materials Engineering +17

Scaling laws for diamond chemical-vapor deposition. I. Diamond surface chemistry

David G. Goodwin · Journal of Applied Physics · 1993 · 241 citations

Natural Sciences, Materials Engineering, Materials Science +16