Publication | Closed Access

Effects of film thickness and sputtering power on properties of ITO thin films deposited by RF magnetron sputtering without oxygen

Materials ScienceMagnetismElectrical EngineeringMaterials EngineeringEngineeringMagnetic Data StorageFilm ThicknessOxide ElectronicsSurface ScienceApplied PhysicsRf MagnetronIto Thin FilmsMagnetic Thin FilmsThin FilmsMicroelectronicsThin Film ProcessingMagnetic Medium