Formation of alpha and beta tantalum at the variation of magnetron sputtering conditions

Abstract

Nano- and microdimensional surface layers of α and β tantalum on flat NiTi, Ti, glass, etc. substrates were created. Structure and composition of samples were defined by SEM, AES and x-ray diffractometry. With increase in deposition time surface layer thickness not linearly increases. The transitional layer provide high adhesion of a surface layer to a substrate. Irrespective of summary sputtering time the β phase is formed in the beginning and at sputtering time more than 20 min on it α tantalum is deposited, while temperature remains below 150°C. Keywords: composite materials, surface layer, tantalum, alpha and beta phase, nitinol, corrosion resistance.