Publication | Closed Access
Morphological dependence on the addition of a soft middle block segment to rigid POSS-containing triblock copolymers for forming cylindrical nanostructures
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Citations
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References
2016
Year
EngineeringMorphological DependenceMechanical EngineeringNanostructured PolymerTriblock CopolymersChemistrySoft MatterPoss DomainChemical EngineeringPolymer MaterialPolymer ChemistryMaterials ScienceHexagonally-packed Cylinders3D PrintingBlock Co-polymersNatural SciencesSelf-assemblyPolymer ScienceCylindrical NanostructuresPoss-containing Triblock CopolymersPolymer Self-assembly
A series of novel polyhedral oligomelic silsesquioxane (POSS)-containing triblock copolymers that self-assemble into hexagonally-packed cylinders of the POSS domain in a polystyrene (PS) matrix was developed in this study.
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