Optical and Electronic Properties of Two-Dimensional Layered Materials

Abstract

Modern semiconductor devices have revolutionized wide-ranging technologies such as electronics, lighting, solar
\nenergy, and communication [1]. The semiconductor industry
\nemploys Si to fabricate electronic circuits, and GaAs,
\nGaN, and other III–V materials for optoelectronics [2], with
\ntypical substrates consisting of wafers manufactured at
\nhigh temperature. Precisely controlled thin films can be
\ndeposited on the substrate to achieve additional functionality, for example by chemical vapor deposition (CVD) or molecular beam epitaxy [3].