Determination of optical properties in nanostructured TiO_2 thin film fabricated by electron beam physical vapor deposition

Abstract

In this research, nanostructured TiO2 thin film was deposited on a glass substrate by the electron beam physical vapor deposition method. X-ray diffraction, field emission scanning electron microscopy, and a UV-VIS-NIR spectrophotometer were used to characterize the structure, morphology, and transmittance spectrum of the TiO2 thin film. X-ray diffraction showed that the TiO2 thin film included both anatase and rutile phases and the field emission scanning electron microscopy indicated the average crystal size was 35 nm. Optical parameters of the TiO2 thin film such as refractive index, extinction coefficient, thickness, and band gap were measured by the Swanepoel method based on the transmittance spectrum.