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A New High Sensitivity Thermoluminescent Phosphor with Low Residual Signal and Good Stability to Heat Treatment: LiF:Mg,Cu,Na,Si
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2002
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Materials ScienceMaterials EngineeringHeat TreatmentPhosphorescence ImagingEngineeringPhotoluminescenceLuminescent GlassLow Residual SignalApplied PhysicsGood StabilityChemistryGlow Curve ShapePhosphoreneLuminescence PropertyOptoelectronicsPhosphorescenceTl SensitivityTl Response
The preliminary investigations are reported on the characteristics of a new, high-sensitivity thermoluminescence phosphor material (LiF:Mg,Cu,Na,Si) prepared in this laboratory. The main dosimetric peak of this phosphor occurs at 197 degrees C at a heating rate of 1 degrees C.s(-1). The glow curve shape shows minimal differences and sensitivity remains stable when annealed in the range from 250 to 280 degrees C for 10 min. Its TL sensitivity to gamma radiation is about 30 times higher than that of TLD-100 with a residual signal 0.2% following a 260 degrees C readout at a heating rate of 15 degrees C.s(-1). This negligible residual signal renders LiF:Mg,Cu,Na,Si usable in unannealed form. Its TL response at both 260 degrees C and 280 degrees C are reproducible within a coefficient of variation of 2% over ten re-use cycles without systematic decrease. It retains the main advantages of LiF:Mg,Cu,P phosphor, and has a lower residual signal and a better stability to heat treatment.