Publication | Closed Access
Electrical characteristics of MoS2 field-effect transistor with ferroelectric vinylidene fluoride-trifluoroethylene copolymer gate structure
52
Citations
31
References
2016
Year
Non-volatile MemoryEngineeringEmerging Memory TechnologyFerroelectric Field-effect TransistorsMos2 Carrier ModulationSemiconductor DeviceSemiconductorsElectrical CharacteristicsElectronic DevicesNanoengineeringNanoelectronicsMos2 Field-effect TransistorMemory DeviceMaterials ScienceElectrical EngineeringNanotechnologyOxide ElectronicsElectronic MemoryElectronic MaterialsApplied PhysicsSemiconductor MemoryMos2 ChannelFunctional Materials
Ferroelectric field-effect transistors (FeFET) based on MoS2 have recently been shown to exhibit considerable potential for use in nano sized non-volatile memory devices. Here, we demonstrated fabrication and characterization of FeFET based on MoS2 channel with vinylidene fluoride (VDF)-trifluoroethylene (TrFE) copolymer as back-gate insulator. In this device, counterclockwise hysteresis behavior was observed in the drain current–gate voltage curve, which is indicative of interaction between MoS2 carrier modulation and ferroelectric polarization switching. Furthermore, our VDF-TrFE/MoS2 FeFET exhibited only n-type behavior, a maximum linear mobility of 625 cm2/V s, a large memory window width of 16 V, and a high on/off current ratio of 8 × 105.
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