Facile Method for the Fabrication of Robust Polyelectrolyte Multilayers by Post-Photo-Cross-Linking of Azido Groups

Abstract

In this letter, we have developed a facile method to enhance the stability of polyelectrolyte multilayers. We fabricate conventional polyelectrolyte multilayers of PAH/PAA through electrostatic layer-by-layer (LbL) assembly and then postinfiltrate photosensitive cross-linking agent 4,4'-diazostilbene-2,2'-disulfonic acid disodium salt into the LbL films. After cross-linking by UV irradiation, the stability of the photo-cross-linked multilayer is highly improved as evidenced by the lack of dissolution under ultrasonication in saturated SDS aqueous solutions for 10 min. Moreover, by taking advantage of the different stability of the LbL film before and after UV irradiation, a patterned surface can be achieved.