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Origin of Superlubricity in a-C:H:Si Films: A Relation to Film Bonding Structure and Environmental Molecular Characteristic
99
Citations
54
References
2014
Year
Tribological CoatingSi FilmsEngineeringMechanical EngineeringSilicon On InsulatorNanotribologySiliceneFilm Bonding StructureThin Film ProcessingMaterials ScienceMaterials EngineeringEnvironmental Molecular CharacteristicSuperlow FrictionPhysicsSemiconductor MaterialHydrogenTribological PropertyMaterial AnalysisSurface ScienceApplied PhysicsThin FilmsTribocorrosionHydrogen Embrittlement
Superlubricity of Si-containing hydrogenated amorphous carbon (a-C:H:Si) films has been systematically investigated in relation to the film bonding structure and the environmental atmosphere. Structural diversity induced by hydrogen incorporation (i.e., 17.3-36.7 at. % H), namely sp(2)-bonded a-C, diamond-like or polymer-like, and tribointeractions activated by the participation of environmental gaseous molecules mainly determine the frictional behaviors of a-C:H:Si films. A suitable control of hydrogen content in the film (i.e., the inherent hydrogen coverage) is obligate to obtain durable superlubricity in a distinct gaseous atmosphere such as dry N2, reactive H2 or humid air. Rapid buildup of running-in-induced antifriction tribolayers at the contact interface, which is more feasible in self-mated sliding, is crucial for achieving a superlubric state. Superior tribological performances have been observed for the polymer-like a-C:H:Si (31.9 at. % H) film, as this hydrogen-rich sample can exhibit superlow friction in various atmospheres including dry inert N2 (μ ∼ 0.001), Ar (μ ∼ 0.012), reactive H2 (μ ∼ 0.003) and humid air (μ ∼ 0.004), and can maintain ultralow friction in corrosive O2 (μ ∼ 0.084). Hydrogen is highlighted for its decisive role in obtaining superlow friction. The occurrence of superlubricity in a-C:H:Si films is generally attributed to a synergistic effect of phase transformation, surface passivation and shear localization, for instance, the near-frictionless state occurred in dry N2. The contribution of each mechanism to the friction reduction depends on the specific intrafilm and interfilm interactions along with the atmospheric effects. These antifriction a-C:H:Si films are promising for industrial applications as lubricants.
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