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Passivation of InAs∕(GaIn)Sb short-period superlattice photodiodes with 10μm cutoff wavelength by epitaxial overgrowth with AlxGa1−xAsySb1−y
109
Citations
7
References
2005
Year
Wide-bandgap SemiconductorOptical MaterialsEngineeringInas∕gasb∕alsb Materials FamilyInfrared PhotodiodesEpitaxial OvergrowthOptoelectronic DevicesCutoff WavelengthOptical PropertiesMolecular Beam EpitaxyCompound SemiconductorMaterials SciencePhotonicsElectrical EngineeringPhotoluminescenceOptoelectronic MaterialsPhotonic DeviceApplied PhysicsGasb SubstrateOptoelectronics
An approach for the passivation of photodiodes based on compounds of the InAs∕GaSb∕AlSb materials family is presented. The passivation is realized by the overgrowth of patterned mesa devices with a quaternary AlxGa1−xAsySb1−y layer, lattice matched to the GaSb substrate. Proof of concept is demonstrated on infrared photodiodes based on InAs∕(GaIn)Sb superlattices with 10μm cutoff wavelength operating at 77 K where suppression of surface leakage currents is observed.
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