Publication | Closed Access
Reaching the Theoretical Resonance Quality Factor Limit in Coaxial Plasmonic Nanoresonators Fabricated by Helium Ion Lithography
115
Citations
45
References
2013
Year
Helium Ion LithographyEngineeringCoaxial Optical AntennaeMetamaterialsElectromagnetic MetamaterialsOptical PropertiesGuided-wave OpticNanolithography MethodNanophotonicsPlasmonic MaterialMaterials SciencePhotonicsPhysicsNanotechnologyPlasmonicsNanomaterialsApplied PhysicsQuality FactorNanofabricationDiffractive Optic
Optical antenna structures have revolutionized the field of nano-optics by confining light to deep subwavelength dimensions for spectroscopy and sensing. In this work, we fabricated coaxial optical antennae with sub-10-nanometer critical dimensions using helium ion lithography (HIL). Wavelength dependent transmission measurements were used to determine the wavelength-dependent optical response. The quality factor of 11 achieved with our HIL fabricated structures matched the theoretically predicted quality factor for the idealized flawless gold resonators calculated by finite-difference time-domain (FDTD). For comparison, coaxial antennae with 30 nm critical dimensions were fabricated using both HIL and the more common Ga focus ion beam lithography (Ga-FIB). The quality factor of the Ga-FIB resonators was 60% of the ideal HIL results for the same design geometry due to limitations in the Ga-FIB fabrication process.
| Year | Citations | |
|---|---|---|
Page 1
Page 1