Publication | Closed Access
Formation Mechanisms of GaN Nanowires Grown by Selective Area Growth Homoepitaxy
108
Citations
23
References
2015
Year
Wide-bandgap SemiconductorEngineeringSemiconductor NanostructuresNanoelectronicsGan Nanowires GrownNanostructure SynthesisNanoscale ScienceMaterials SciencePhysicsNanotechnologySelective Area GrowthAluminum Gallium NitrideFull CoalescenceFormation MechanismsCategoryiii-v SemiconductorNanomaterialsApplied PhysicsGan Power DeviceGan Nanowires
This work provides experimental evidence and theoretical explanations regarding the formation mechanisms of GaN nanowires grown by selective area growth on GaN-on-sapphire templates. The first growth stage, driven by selective area growth kinetics, consists of initial nucleation (along the nanohole inner periphery), coalescence onset and full coalescence, producing a single nanocrystal within each nanohole. In the second growth stage, driven by free-surface-energy minimization, the formed nanocrystal undergoes morphological evolution, exhibiting initial cylindrical-like shape, intermediate dodecagonal shape and a final, thermodynamically stable hexagonal shape. From this point on, the nanowire vertical growth proceeds while keeping the stable hexagonal form.
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