Thin Films of Molybdenum Disulfide Doped with Chromium by Aerosol-Assisted Chemical Vapor Deposition (AACVD)

Abstract

A combined single-source precursor approach has been developed for the deposition of thin films of Cr-doped molybdenum disulfide (MoS2) by aerosol-assisted chemical vapor deposition (AACVD). Tris(diethyldithiocarbamato)chromium(III) can also be used for the deposition of chromium sulfide (CrS). Films have been analyzed by a range of techniques including scanning electron microscopy (SEM), energy dispersive X-ray (EDX) spectroscopy, Raman spectroscopy, and powder X-ray diffraction (pXRD) to elucidate film morphology, composition, and crystallinity. The presence of Cr in the MoS2 films produces a number of striking morphological, crystallographic, and nanomechanical changes to the deposited films. The chromium dopant appears to be uniform throughout the MoS2 from the scanning transmission electron microscopy (STEM) EDX spectrum imaging of nanosheets produced by liquid-phase exfoliation of the thin films in N-methyl-2-pyrollidone.