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Interface Structure and Corrosion Resistance of Ti/Cr Nanomultilayer Film Prepared by Magnetron Sputtering on Depleted Uranium
21
Citations
12
References
2013
Year
Materials ScienceMaterials EngineeringCorrosion ProtectionEngineeringCorrosionOxidation ResistanceSurface ScienceApplied PhysicsDepleted UraniumChemical DepositionTi InterlayerInterface StructureThin Film ProcessingCorrosion Resistance
Uranium has broadened utility in military and civilization; however, it is extremely apt to oxidation corrosion. Ti/Cr nanomultilayer film was prepared by unbalanced magnetron sputtering on the surface of depleted uranium (DU) to improve its corrosion resistance. The SEM morphologies show that Ti/Cr multilayer film has fine grain and high density. The Auger electron spectroscopy is used to investigate the depth profiles of Ti, U, and O elements of interface between DU substrate and the Ti interlayer, and indicates that the mutual diffusion area of U and Ti is formed at the interface. The TEM cross-section microstructure shows that the multilayer film has alternative Ti and Cr layers and form a perfect modulation structure. The modulation period is measured to be 4.8 nm in TEM morphology, the thickness ratio of Ti to Cr could be estimated to be about 1:2. Potentiodynamic polarization curves show that, after depositing Ti/Cr nanomultilayer film, the corrosion potential increases while the corrosion current density decreases obviously. The surface of Ti/Cr nanomultilayer film exhibits a pseudo passivation behavior when the polarization potential increased from -50 to 400 mV. It was indicated that, after depositing Ti/Cr nanomultilayer film by unbalanced magnetron sputtering, the corrosion resistance of DU was effectively improved.
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