Nanoscale Precision of 3D Polymerization via Polarization Control

Abstract

Polarization effects in laser 3D nanolithography are employed to fine-tune the feature sizes in the structuring of photoresist. The vectorial Debye theory is used for modelling and a variation of up to ≈20% in the line width of SZ2080 is shown experimentally for the identical axial extent. This proves polarization to be a variable parameter for voxel-aspect ratio control. As a service to our authors and readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed and may be re-organized for online delivery, but are not copy-edited or typeset. Technical support issues arising from supporting information (other than missing files) should be addressed to the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.