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Formation of High-T<sub>c</sub> Superconducting BiSrCaCu<sub>2</sub>O<sub>x</sub> Films on ZrO<sub>2</sub>/Si(100)
15
Citations
7
References
1988
Year
Materials ScienceSuperconducting MaterialElectrical EngineeringHigh-tc SuperconductivityEngineeringPhysicsBismuth-based SuperconductorsOxide ElectronicsCondensed Matter PhysicsQuantum MaterialsSuperconductivityApplied PhysicsO X FilmsHigh Tc SuperconductorsBisrcacu 2Thin FilmsZro 2Epitaxial Growth
High- T c superconducting BiSrCaCu 2 O x films have been successfully prepared on Si(100) wafer coated with epitaxially grown tetragonal ZrO 2 as a buffer layer. The films have been formed by pyrolysis of 2-ethylhexanoates. Regarding superconducting features, T c (onset) observed is 97 K and T c (end) is 50 K. From the X-ray diffraction patterns, the c -axis of the superconducting crystal phase mostly orients perpendicular to the substrate. These present results seem to prove the usefulness of ZrO 2 layer on Si for the further application of high- T c oxide films for a part of sophisticated electronics devices.
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