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Interdigitated back‐contact heterojunction solar cell concept for liquid phase crystallized thin‐film silicon on glass
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Citations
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References
2015
Year
EngineeringJ ScOptoelectronic DevicesInterdigitated EmitterThin Film Process TechnologyPhotovoltaicsSemiconductorsElectronic DevicesThin‐film SiliconSolar Cell StructuresThin Film ProcessingMaterials ScienceElectrical EngineeringThin-film FabricationLiquid PhaseSemiconductor MaterialSemiconductor Device FabricationElectronic MaterialsApplied PhysicsAlkaline SolutionsThin FilmsSolar CellsSolar Cell Materials
Abstract We present an interdigitated back‐contact silicon heterojunction system designed for liquid‐phase crystallized thin‐film (~10 µm) silicon on glass. The preparation of the interdigitated emitter (a‐Si:H(p)) and absorber (a‐Si:H(n)) contact layers relies on the etch selectivity of doped amorphous silicon layers in alkaline solutions. The etch rates of a‐Si:H(n) and a‐Si:H(p) in 0.6% NaOH were determined and interdigitated back‐contact silicon heterojunction solar cells with two different metallizations, namely Al and ITO /Ag electrodes, were evaluated regarding electrical and optical properties. An additional random pyramid texture on the back side provides short‐circuit current density ( j SC ) of up to 30.3 mA /cm 2 using the ITO /Ag metallization. The maximum efficiency of 10.5% is mainly limited by a low of fill factor of 57%. However, the high j SC , as well as V OC values of 633 mV and pseudo‐fill factors of 77%, underline the high potential of this approach. Copyright © 2015 John Wiley & Sons, Ltd.
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